Polymerization shrinkage and thermal cooling effect have been identified as two major factors that lead to the curl distortion in the stereolithography apparatus (SLA) process. In this paper, the photocuring temperature during the building process of mask image projection-based stereolithography (MIP-SL) and how it affects parts' curl distortion are investigated using a high-resolution infrared (IR) camera. Test cases of photocuring layers with different shapes, sizes, and layer thicknesses have been designed and tested. The experimental results reveal that the temperature increase of a cured layer is mainly related to the layer thickness, while the layer shapes and sizes have little effect. The photocuring temperatures of built layers using different exposure strategies including varying exposure time, grayscale levels, and mask image patterns have been studied. The curl distortions of a test case based on various exposure strategies have been measured and analyzed. It is shown that, by decreasing the photocuring temperature of built layers, the exposure strategies using grayscale levels and mask image patterns can effectively reduce the curl distortion with the expense of increased building time. In addition to curl distortion control, the photocuring temperature study also provides a basis for the curl distortion simulation in the MIP-SL process.
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February 2017
Research-Article
Photocuring Temperature Study for Curl Distortion Control in Projection-Based Stereolithography
Kai Xu,
Kai Xu
Epstein Department of Industrial and
Systems Engineering,
University of Southern California,
Los Angeles, CA 90089
Systems Engineering,
University of Southern California,
Los Angeles, CA 90089
Search for other works by this author on:
Yong Chen
Yong Chen
Epstein Department of Industrial and
Systems Engineering,
University of Southern California,
Los Angeles, CA 90089
e-mail: yongchen@usc.edu
Systems Engineering,
University of Southern California,
Los Angeles, CA 90089
e-mail: yongchen@usc.edu
Search for other works by this author on:
Kai Xu
Epstein Department of Industrial and
Systems Engineering,
University of Southern California,
Los Angeles, CA 90089
Systems Engineering,
University of Southern California,
Los Angeles, CA 90089
Yong Chen
Epstein Department of Industrial and
Systems Engineering,
University of Southern California,
Los Angeles, CA 90089
e-mail: yongchen@usc.edu
Systems Engineering,
University of Southern California,
Los Angeles, CA 90089
e-mail: yongchen@usc.edu
1Corresponding author.
Manuscript received February 23, 2016; final manuscript received July 18, 2016; published online August 24, 2016. Assoc. Editor: Donggang Yao.
J. Manuf. Sci. Eng. Feb 2017, 139(2): 021002 (14 pages)
Published Online: August 24, 2016
Article history
Received:
February 23, 2016
Revised:
July 18, 2016
Citation
Xu, K., and Chen, Y. (August 24, 2016). "Photocuring Temperature Study for Curl Distortion Control in Projection-Based Stereolithography." ASME. J. Manuf. Sci. Eng. February 2017; 139(2): 021002. https://doi.org/10.1115/1.4034305
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