In this paper, the lapping process of wafer surfaces is studied with experiments and contact modeling of surface roughness. In order to improve the performance of the lapping processes, effects of mixed abrasive grits in the slurry of the free abrasive machining (FAM) process are studied using a single-sided wafer-lapping machine. Under the same slurry density, a parametric experimental study employing different mixing ratios of large and small abrasive grits and various normal loadings on the wafer surface applied through a jig is conducted. Observations and measurements of the total amount of material removed, material removal rate, surface roughness, and relative angular velocity are presented as a function of various mixing ratios and loadings and discussed in the paper. The experiments show that the 1:1 mixing ratio of abrasives removes more material than other mixing ratios under the same conditions, with a slightly higher surface roughness. Modeling of the mixed abrasive particle distributions correspondingly indicates that the roughness trend is due to the abrasive size distribution and the particle contact mechanics. The results of this study can provide a good reference to the FAM processes that practitioners use today by exploiting different abrasive mixing ratios in slurry and normal loadings in the manufacturing processes.

References

1.
Bhagavat
,
S.
,
Liberato
,
J. C.
,
Chung
,
C.
, and
Kao
,
I.
, 2010, “
Effects of Mixed Abrasive Grits in Slurries on Free Abrasive Machining (FAM) Processes
,”
Int. J. Mach. Tools Manuf.
,
50
, pp.
843
847
.
2.
ITRS, 2005, International Technology Roadmap for Semiconductors 2005 edition, Website: http://www.itrs.net/.
3.
Singer
,
P.
, 2005, “
Is the Industry Ready for 450 mm Wafers?
,”
Semicond. Int.
,
28
(
3
), pp.
15
.
4.
Pettinato
,
J. S.
, and
Pillai
,
D.
, 2005, “
Technology Decisions to Minimize 450-mm Wafer Size Transition Risk
,”
IEEE Trans. Semicond. Manuf.
,
18
(
4
), pp.
501
509
.
5.
Draina
,
J.
,
Fandel
,
D.
,
Ferrell
,
J.
, and
Kramer
,
S.
, 2006, “
Lessons Learned From the 300 mm Transition
,”
ECS Trans.
,
2
(
2
), pp.
135
154
.
6.
Watanabe
,
M.
, and
Kramer
,
S.
, 2006, “
450 mm Silicon: An Opportunity and Wafer Scaling
,”
Electrochem. Soc. Interface
,
15
(
4
), pp.
28
31
.
7.
Chien
,
C.
,
Wang
,
J. K.
,
Chang
,
T.
, and
Wu
,
W.
, 2007, “
Economic Analysis of 450mm Wafer Migration
,”
IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings, 2007 International Symposium on Semiconductor Manufacturing, ISSM–Conference Proceedings
, pp.
283
286
.
8.
Hand
,
A.
, 2007, “
Ismi Updates Goals, Challenges of 450 mm Wafers
,”
Semicond. Int.
,
30
(
1
), p.
24
.
9.
Intel News Release, 2008, Intel, Samsung Electronics, TSMC reach agreement for 450 mm wafer manufacturing transition. Website: http://www.intel.com/pressroom/archive/releases/2008/20080505corp.htm.
10.
Chung
,
C.
, and
Kao
,
I.
, 2008, “
Comparison of Free Abrasive Machining Processes in Wafer Manufacturing
,”
ASME International Conference on Manufacturing Science and Engineering (MSEC 2008)
, no. ASME Paper No. MSEC2008-72253, ASME.
11.
Yang
,
F.
, and
Kao
,
I.
, 2001. “
Free Abrasive Machining in Slicing Brittle Materials With Wiresaw
,”
J. Electron. Packag.
,
123
, pp.
254
259
.
12.
Bhagavat
,
S.
, and
Kao
,
I.
, 2006, “
Ultra-Low Load Multiple Indentation Response of Materials: In Purview of Wiresaw Slicing and Other Free Abrasive Machining (FAM) Processes
,”
Int. J. Mach. Tools Manuf.
,
46
(
5
), pp.
531
541
.
13.
Lawn
,
B.
, 1993,
Fracture of Brittle Solids–Second Edition
,
Cambridge University Press
,
Cambridge, United Kingdom
.
14.
Phillips
,
K.
,
Crimes
,
G. M.
, and
Wilshaw
,
T. R.
, 1977, “
On the Mechanism of Material Removal by Free Abrasive Grinding Of Glass and Fused Silica
,”
Wear
,
41
, pp.
327
350
.
15.
Buijs
,
M.
, and
Houten
,
K. K.
, 1993, “
Three-Body Abrasion of Brittle Materials as Studied by Lapping
,”
Wear
,
166
, pp.
237
245
.
16.
Buijs
,
M.
, and
Houten
,
K. K.
, 1993, “
A Model for Lapping of Glass
,”
J. Mater. Sci.
,
28
, pp.
3014
3020
.
17.
Chauhan
,
R.
,
Ahn
,
Y.
,
Chandrasekar
,
S.
, and
Farris
,
T. N.
, 1993, “
Role of Indentation Fracture in Free Abrasive Machining of Ceramics
,”
Wear
,
162–164
, pp.
246
257
.
18.
Chang
,
Y. P.
,
Hashimura
,
M.
, and
Dornfeld
,
D. A.
, 2000, “
An Investigation of Material Removal Mechanisms in Lapping With Grain Size Transition
,”
J. Manuf. Sci. Eng.
,
122
, pp.
413
419
.
19.
Heisel
,
U.
, and
Avroutine
,
J.
, 2001, “
Process Analysis for the Evaluation of the Surface Formation and Removal Rate in Lapping
,”
CIRP Ann.
,
50
(
1
), pp.
229
232
.
20.
Marinescu
,
I. D.
,
Uhlmann
,
E.
, and
Doi
,
T. K.
, eds., 2007,
Handbook of Lapping and Polishing
,
CRC Press
,
FL
.
21.
Bifano
,
T.
,
Dow
,
T.
, and
Scattergood
,
R.
, 1991, “
Ductile-Regime Grinding: A New Technology for Machining of Brittle Materials
,”
J. Eng. Ind.
,
113
, pp.
184
189
.
22.
Liu
,
W.
,
Pei
,
Z. J.
, and
Xin
,
X. J.
, 2002, “
Finite Element Analysis for Grinding and Lapping of Wire-Sawn Silicon Wafers
,”
J. Mater. Process. Technol.
,
129
(
1–3
), pp.
2
9
.
23.
Pei
,
Z. J.
,
Fisher
,
G. R.
, and
Liu
,
J.
, 2008, “
Grinding of Silicon Wafers: A Review From Historical Perspectives
,”
Int. J. Mach. Tools Manuf.
,
48
, pp.
1297
1307
.
24.
Li
,
Z.
,
Pei
,
Z.
, and
Fisher
,
G. R.
, 2006, “
Simultaneous Double Side Grinding of Silicon Wafers: A Literature Review
,”
Int. J. Mach. Tools Manuf.
,
46
, pp.
1449
1458
.
25.
Brown
,
N. J.
,
Baker
,
P. C.
, and
Maney
,
R. T.
, 1981, “
Optical Polishing of Metals
,”
Proc. SPIE
,
306
, pp.
42
57
.
26.
Cook
,
L. M.
, 1990, “
Chemical Processes in Glass Polishing
,”
J. Non-Cryst. Solids
,
120
, pp.
152
171
.
27.
Imanaka
,
O.
, 1966, “
Lapping Mechanics of Glass—Especially on Roughness of Lapped Surface
,”
CIRP Ann.
,
13
, pp.
227
233
.
28.
Wang
,
C.
,
Sherman
,
P.
,
Chandra
,
A.
, and
Dornfeld
,
D.
, 2005, “
Pad Surface Roughness and Slurry Particle Size Distribution Effects on Material Removal Rate in Chemical Mechanical Planarization
,”
CIRP Ann.
,
54
, pp.
309
312
.
29.
Kao
,
I.
, 2004, “
Technology and Research of Slurry Wiresaw Manufacturing Systems in Wafer Slicing With Free Abrasive Machining
,”
Int. J. Adv. Manuf. Syst. (IJMAS), Spec Issue Decis. Eng.
,
7
(
2
), pp.
7
20
.
30.
Preston
,
F. W.
, 1927, “
The Theory and Design of Plate Glass Polishing Machines
,”
J. Soc. Glass Technol.
,
11
, pp.
214
256
.
31.
Choi
,
W.
,
Abiade
,
J.
,
Lee
,
S.-M.
, and
Singh
,
R.
, 2004, “
Effects of Slurry Particles on Silicon Dioxide CMP
,”
J. Electrochem. Soc.
,
151
(
8
), pp.
G512
G522
.
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