...Yuwen Zhang Numerical analysis of laser chemical vapor deposition (LCVD) of titanium nitride by a moving laser beam is presented. The effect of natural convection due to temperature and concentration differences in the gaseous mixture is modeled and implemented into thermal model of LCVD...

...Hoseon Yoo; Yogesh Jaluria, Fellow ASME This paper deals with the continuous chemical vapor deposition of silicon in a horizontal cold wall reactor, paying special attention to a moving susceptor. A two-dimensional numerical model, which accounts for variable properties, thermal diffusion...

...J. F. Horton; J. E. Peterson A laser-induced Rayleigh light scattering (RLS) system was used to measure transient gas temperatures in a simulated rapid chemical vapor deposition (RCVD) reactor. The test section geometry was an axisymmetric jet of carrier gas directed down, impinging on a heated...

...K. S. Park; M. Choi An analysis of unsteady heat and mass transfer in the modified chemical vapor deposition has been carried out. It is found that the commonly used quasi-steady-state assumption could be used to predict the overall efficiency of particle deposition; however, the assumption would...